Developer null for positive die huotorejisuto

摘要

PURPOSE:To obtain a developer having superior sensitivity and a high rate of leaving of a film, causing no exfoliation of a surface layer, generating no film residue and also having superior wetting and nonfoaming properties by adding a specified amt. of a specified nonionic surfactant to a developer for a positive type photoresist contg. a basic compd. as a principal component. CONSTITUTION:Nonionic surfactant represented by formula I is added by 10-10,000ppm to a developer for a positive type photoresist contg. a basic compd. as a principal component. In the formula I, X is oxyethylene, Y is oxypropylene, R is H, 1-8C alkyl, etc., R' is -O(-X-)m(-Y-)nH, each of (m) and (n) is an integer of 1-50, m:n=20:80-80:20, (p) is 0 or 1, each of (q) and (s) is an integer of 0-4, p+q+s=4 and q+s=3 or 4. A developer causing no exfoliation of a surface layer, generating no film residue and having a high rate of leaving of a film, superior wetting and nonfoaming properties is obtd.