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Reflected electronic energy - loss microstructure measuring method
Reflected electronic energy - loss microstructure measuring method
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机译:反射电子能量损失显微组织测量方法
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摘要
PURPOSE:To obtain a small-sized device easy to utilize by slantly radiating an incident electron beam on the sample surface at a small angle and measuring the energy loss spectrum of nonelastic scattered electrons reflected from the sample surface to measure the fine structure. CONSTITUTION:High-speed electrons are radiated to the surface of a sample to be measured 8 at a low incident angle with a device as shown by the figure, the energy loss spectrum of the nonelastic scattered electrons reflected from the surface of the sample to be measured 8 is measured by an energy analyzer 9, and the spectrum equivalent to the inner shell-excited X-ray absorption spectrum is determined. The vibration component (EXAFS) indicated in the spectrum and the X-ray absorption near edge structure (XANES) are analyzed to obtain the information on the surface arrangement and electronic state. Accordingly, measurement is performed by incident electrons, thus a large-scale facility such as the synchrotron orbital radiation light is not required and a small-sized electron source is sufficient, and the difficult problem of the spectroscopy is eliminated and the device is made easy to handle.
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