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Buried heterostructure lasers using MOCVD growth over patterned substrates

机译:在图案化衬底上使用MOCVD生长的埋入异质结构激光器

摘要

This invention pertains to buried heterostructure lasers which have been fabricated using a single step MOCVD growth of an MQW laser structure over a pattern etched GaAs substrate. The wet chemical etching of grooves having a dovetailed cross-section and being parallel to the [011¯] direction in GaAs substrates produced reentrant mesas which resulted in isolated laser active regions (17-2) buried by the AlGaAs cladding layer (18). The 250 µm long uncoated lasers emit at about 1 µm. Lasers with coated facets have threshold currents of 20 mA and emit 100 mW per facet under room temperature operation. The external differential quantum efficiency for currents of from 30 mA to about 50 mA is found to be nearly independent of temperature in the range of 10°C to 90°C suggesting a low temperature dependence of leakage current.
机译:本发明涉及掩埋异质结构激光器,该掩埋异质结构激光器是通过在图案蚀刻的GaAs衬底上使用MQW激光器结构的单步MOCVD生长来制造的。在GaAs基板上对具有燕尾形横截面且平行于[011]方向的凹槽进行湿式化学蚀刻会产生凹状台面,从而导致隔离的激光有源区域(17-2)被AlGaAs包层(18)掩埋。 250微米长的未镀膜激光发射​​约1微米。具有涂层的刻面的激光器具有20 mA的阈值电流,并且在室温操作下每个刻面发出的功率大于100 mW。发现对于30 mA至约50 mA的电流,外部差分量子效率几乎与10°C至90°C范围内的温度无关,这表明泄漏电流的温度依赖性较低。

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