STEPPING PITCH MEASURING METHOD OF ALIGNMENT/EXPOSURE APPARATUS

摘要

forming a photosensitive film on a wafer; performing a first aligning/exposing operation on the photosensitive film by using a reticle having a pair of precision measuring patterns; moving an aligning/exposing device by one step pitch; performing a second aligning/exposing operation on the photosensitive film corresponding to the precision measuring pattern positioned towards a moving direction among the pair of precision measuring patterns; and checking the precision measuring pattern patterned after the exposed wafer is developed.