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Substrate replacement method, substrate processing method and substrate processing apparatus in substrate processing apparatus
Substrate replacement method, substrate processing method and substrate processing apparatus in substrate processing apparatus
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机译:基板更换方法,基板处理方法以及基板处理装置中的基板处理装置
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摘要
When replacing a certain treatment liquid (first treatment liquid) contained in the treatment tank with another treatment liquid (second treatment liquid), while discharging the first treatment liquid in the treatment tank from the bottom of the treatment tank, Is supplied from the upper part of the treatment tank while balancing the discharge amount of the first treatment solution and the supply amount of the second treatment solution at this time. In this way, it is possible to replace the treatment liquid in the treatment tank of the substrate processing apparatus by reducing the amount of the treatment liquid used. In addition, by using this process liquid substitution method, it is possible to efficiently perform the substrate treatment by plural types of treatment liquids in one treatment tank.
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