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Substrate replacement method, substrate processing method and substrate processing apparatus in substrate processing apparatus

机译:基板更换方法,基板处理方法以及基板处理装置中的基板处理装置

摘要

When replacing a certain treatment liquid (first treatment liquid) contained in the treatment tank with another treatment liquid (second treatment liquid), while discharging the first treatment liquid in the treatment tank from the bottom of the treatment tank, Is supplied from the upper part of the treatment tank while balancing the discharge amount of the first treatment solution and the supply amount of the second treatment solution at this time. In this way, it is possible to replace the treatment liquid in the treatment tank of the substrate processing apparatus by reducing the amount of the treatment liquid used. In addition, by using this process liquid substitution method, it is possible to efficiently perform the substrate treatment by plural types of treatment liquids in one treatment tank.
机译:当用另一种处理液(第二处理液)代替处理槽中容纳的某种处理液(第一处理液)时,从处理槽的底部排出处理槽中的第一处理液,并从上部供给。此时,在平衡第一处理液的排出量和第二处理液的供给量的同时,使处理槽的容积减小。以此方式,可以通过减少所使用的处理液的量来替换基板处理设备的处理槽中的处理液。另外,通过使用该处理液置换方法,可以在一个处理槽内通过多种处理液有效地进行基板处理。

著录项

  • 公开/公告号KR960035756A

    专利类型

  • 公开/公告日1996-10-24

    原文格式PDF

  • 申请/专利权人 이시다 아키라;

    申请/专利号KR19960008005

  • 发明设计人 무라오카 유우스케;

    申请日1996-03-23

  • 分类号H01L21/02;

  • 国家 KR

  • 入库时间 2022-08-22 03:44:27

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