Apparatus for the production of layers with a uniform thickness profile on substrates by cathode sputtering

摘要

in a device for the production of layers with uniform thickness on substrates by cathode sputtering (fig. 1) is a between rolls (5, 5 '), and by the substratschlitten (6) which, by the beschichtungskammer (2) through movements and on the cathode (3) can be mounted in side substratscheiben (13, 13 '.the rotationsachsen) in each transverse to the bewegungsebene of substratschlittens (6) are arranged. the cathode (3) on the far side of the substratschlittens (6) are in the beschichtungskammer (2) a number (18) of permanent magnets (11, 11 ',...) on magnethaltern (25) arranged on the vehicle, in magnetscheiben (12, 12',...), with the rotation (16, 16 ',...the substratscheiben drehfest) are connected, a scheibenstrom is generated. as a result of the scheibenstroms reach the magnetscheiben (12, 12 ',...), and thus the substratscheiben (13, 13',...) crossing the magnetreihe (18) in rotation.