首页> 美国卫生研究院文献>Scientific Reports >Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films
【2h】

Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films

机译:磁控溅射镍/碳多层膜中层厚度变化的微观结构演变

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

The microstructure evolution of magnetron-sputtered Ni/C multilayers was investigated by varying the Ni and C layer thickness in the region of a few nanometers. For the samples having 2.6-nm-thick C layers, the interface width increases from 0.37 to 0.81 nm as the Ni layer thickness decreases from 4.3 to 1.3 nm. Especially for the samples with Ni layers less than 2.0 nm, the interface width changes significantly due to the discontinuously distributed Ni crystallites. For the samples having 2.8-nm-thick Ni layers, the interface width increases from 0.37 to 0.59 nm when the C layer thickness decreases from 4.3 to 0.7 nm. The evolution of interface microstructures with varied Ni and C layers is explained based on a proposed simple growth model of Ni and C layers.
机译:通过在几纳米区域内改变Ni和C层的厚度,研究了磁控溅射Ni / C多层膜的微观结构演变。对于具有2.6nm厚C层的样品,随着Ni层厚度从4.3减小到1.3 nm,界面宽度从0.37增大到0.81 nm。特别是对于Ni层厚度小于2.0?nm的样品,由于Ni晶粒的不连续分布,界面宽度发生了显着变化。对于具有2.8nm厚的Ni层的样品,当C层的厚度从4.3减小到0.7 nm时,界面宽度从0.37增大到0.59 nm。基于提出的简单的镍和碳层生长模型,解释了具有变化的镍和碳层的界面微观结构的演变。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号