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Several times - quantum well - semiconductor laser with the pretensioned the grid and the production method.
Several times - quantum well - semiconductor laser with the pretensioned the grid and the production method.
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机译:数次-量子阱-具有预张紧的半导体激光器的栅极及其制造方法。
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摘要
PURPOSE: To provide a distortion multiple quantum well semiconductor laser which enables rapid operation without generating transfer inside an active layer. ;CONSTITUTION: The device is a distortion multiple quantum well semiconductor laser which is formed of an n-type In0.76Ga0.24As0.55P0.45 waveguide layer 102, a nondoped In0.7Ga0.3As/In0.76Ga0.24As0.55P0.45 distortion multiple quantum well active layer 103 and a p-type InP clad layer 104 on an n-type InP substrate 101. The distortion multiple quantum well active layer 103 consists of a ten-layer 3nm-thick In0.7Ga0.3As distortion well layer 114 and an In0.76Ga0.24As0.55P0.45 barrier layer. A barrier layer which is a fifth layer from the substrate 101 is a 30nm-thick distortion absorbing layer 115, and eight-layer barrier layer excepting it is 10nm-thick. According to this constitution, it is possible to readily acquire a semiconductor laser which is free from transfer into the active layer 103 and deterioration of injection efficiency of a hole and enables rapid operation.;COPYRIGHT: (C)1994,JPO&Japio
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机译:目的:提供一种变形多量子阱半导体激光器,该激光器能够快速运行而不会在有源层内部产生转移。 ;组成:该器件是一种变形多量子阱半导体激光器,由n型In 0.76 Sub> Ga 0.24 Sub> As 0.55 Sub> P < Sub> 0.45 Sub>波导层102,未掺杂的In 0.7 Sub> Ga 0.3 Sub> As / In 0.76 Sub> Ga 0.24 Sub在n型InP衬底101上> As 0.55 Sub> P 0.45 Sub>畸变多量子阱有源层103和p型InP包覆层104。层103由十层3nm厚的In 0.7 Sub> Ga 0.3 Sub> As畸变阱层114和In 0.76 Sub> Ga 0.24组成 Sub> As 0.55 Sub> P 0.45 Sub>阻挡层。作为距基板101的第五层的阻挡层是厚度为30nm的畸变吸收层115,除此以外的八层阻挡层是厚度为10nm。根据该结构,可以容易地获得一种半导体激光器,该半导体激光器不会转移到有源层103中,并且不会降低空穴的注入效率,并且能够快速地进行操作。(版权):( C)1994,JPO&Japio
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