Method and arrangement for charge carrier profiling in semiconductor structure by means of AFM scanning

摘要

In the atomic force microscopy method, the scanning system modified to provide high-frequency control is set into oscillation by electrical pulses having an amplitude that is adjustable and variable within a wide range. The pulses are so short that contact between the scanning tip and the sample is avoided. The pulse amplitude and/or form are varied in order to generate space charge zones in the semiconductor structures that are shaped differently within wide limits.