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FIELD-EFFECT TYPE PHOTOELECTRIC ENERGY CONVERTER

机译:场效应型光电能量转换器

摘要

PROBLEM TO BE SOLVED: To increase an electric field in a semiconductor in the vicinity of a ferroelectric, and to inhibit the recombination of an electron-hole pair generated by light by forming a comb-shaped electrode and a ferroelectric layer on a hydrogenated amorphous silicon layer. ;SOLUTION: A lower electrode 32 is formed onto a substrate 31, a p-type hydrogenated amorphous silicon layer 33, an i-type hydrogenated amorphous silicon layer 34 and an n-type hydrogenated amorphous silicon layer 35 are growm successively on the lower electrode 32. The hydrogenated amorphous silicon layers may also have n-i-p structure, and the hydrogenated amorphous silicon layers excepting the uppermost layer 35 may also have only i-p structure and i-n structure. Comb-shaped electrodes 36 are formed onto the n-type hydrogenated amorphous layers 35, and a ferroelectric layer 37 is grown on the electrodes 36. A transparent conductive film 38 as an upper electrode is formed onto a surface. According to such constitition, an electric field is induced to the hydrogenated amorphous silicon layer by the spontaneous polarization effect of the ferroelectric layer. Consequently, the recombination of electrons and holes is inhibited by the increase of the electric field induced by the spontaneous polarization effect of a ferroelectric.;COPYRIGHT: (C)1997,JPO
机译:解决的问题:通过在氢化非晶硅上形成梳状电极和铁电层,来增加铁电附近的半导体中的电场,并抑制由光产生的电子-空穴对的复合。层。 ;解决方案:在基板31上形成下部电极32,在下部电极上依次生长p型氢化非晶硅层33,i型氢化非晶硅层34和n型氢化非晶硅层35。 32.氢化非晶硅层也可以具有辊隙结构,除了最上层35以外的氢化非晶硅层也可以仅具有ip结构。梳状电极36形成在n型氢化非晶层35上,并且铁电层37生长在电极36上。作为上电极的透明导电膜38形成在表面上。根据这种构造,通过铁电层的自发极化效应,电场被感应到氢化非晶硅层。因此,由于铁电体的自发极化效应引起的电场的增加,电子和空穴的复合受到了抑制。;版权所有:(C)1997,日本特许厅

著录项

  • 公开/公告号JPH09213987A

    专利类型

  • 公开/公告日1997-08-15

    原文格式PDF

  • 申请/专利权人 KAGAKU GIJUTSU SHINKO JIGYODAN;

    申请/专利号JP19960016623

  • 发明设计人 KOINUMA HIDEOMI;

    申请日1996-02-01

  • 分类号H01L31/10;H01L31/04;

  • 国家 JP

  • 入库时间 2022-08-22 03:37:15

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