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SEMICONDUCTOR COATING FILM FORMING EQUIPMENT, AND THIN FILM SOLAR CELL AND FORMING METHOD OF THIN FILM SOLAR CELL
SEMICONDUCTOR COATING FILM FORMING EQUIPMENT, AND THIN FILM SOLAR CELL AND FORMING METHOD OF THIN FILM SOLAR CELL
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机译:半导体涂膜成膜设备,薄膜太阳电池及薄膜太阳电池的形成方法
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摘要
PURPOSE: To obtain an equipment capable of forming a thin film solar cell wherein optical deterioration is little while high initial conversion efficiency is maintained, by a method wherein a substrate is carried in a specified direction in a glow discharge space, and a substrate heating means heats the substrate at different temperatures in the carrying direction of the substrate. ;CONSTITUTION: The equipment consists of reaction chambers 502-504, exhausting means 523-525 for vacuumizing the reaction chambers 502-504, gas introducing means 526-528 for introducing gas into the reaction chamber 502-504, glow discharge generating means 515-517 installed in the reaction chambers 502-504, and substrate heating means 510-514 installed in the reaction chambers 502-504. A substrate 401 is carried in a specified direction in a glow discharge space formed by the glow discharge generating means 515-517. The substrate heating means 510-514 heats the substrate 401 at different temperatures in the carrying direction of the substrate 401. For example, a flexible substrate 401 is carried by a roll to roll system.;COPYRIGHT: (C)1996,JPO
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