首页> 外国专利> DEPOSITION METHOD FOR MONOMOLECULAR FILM OR MULTILAYER FILM THEREOF AND MANUFACTURE OF RECORDING MEDIUM

DEPOSITION METHOD FOR MONOMOLECULAR FILM OR MULTILAYER FILM THEREOF AND MANUFACTURE OF RECORDING MEDIUM

机译:单分子膜或多层膜的沉积方法及其记录介质的制备

摘要

PROBLEM TO BE SOLVED: To form a uniform monomolecular film or multi-layered molecular film and carry out high density recording with excellent reproductivity and excellent reproduction of the recording by forming a first region and a second region in a substrate and carrying out film deposition on the first region prior to the film deposition on the second region. ;SOLUTION: A material for a substrate 11 to compose a recording medium may be one having conductive and smooth surface and materials such as gold, platinum, silver, palladium, etc., are examples of the material. At the time of depositing a monomolecular film or a multilayer film of monomolecular layers on the substrate 11, a first region 12 and a second region 14 are set in the substrate 11 and prior to the film deposition on the second region 14, film deposition on the first region 12 is carried out. The surface area ratio of the previous deposition region 12 to the recording medium-forming region 14 in a single substrate is not especially limited as long as the ratio is within a satisfactory range to carry out recording and reproduction of information on the recording medium-forming region 4. The length 15 of the recording medium-forming region 14 in the longitudinal direction of the substrate is however preferably 10nm or longer.;COPYRIGHT: (C)1997,JPO
机译:解决的问题:形成均匀的单分子膜或多层分子膜并通过在基板上形成第一区域和第二区域并在其上进行膜沉积来进行具有优异的再现性和记录再现性的高密度记录。在第二区域上进行薄膜沉积之前,先在第一区域进行操作。 ;解决方案:用于构成记录介质的基板11的材料可以是具有导电且光滑的表面的材料,并且诸如金,铂,银,钯等的材料是该材料的示例。在基板11上沉积单分子膜或单分子层的多层膜时,在基板11中设置第一区域12和第二区域14,并且在将膜沉积在第二区域14上之前,在进行第一区域12。对单个基板中的先前沉积区域12与记录介质形成区域14的表面积之比没有特别限制,只要该比率在令人满意的范围内以执行关于记录介质形成的信息的记录和再现即可。然而,记录介质形成区域14在基板的纵向上的长度15优选为10nm或更长。;版权:(C)1997,JPO

著录项

  • 公开/公告号JPH09225379A

    专利类型

  • 公开/公告日1997-09-02

    原文格式PDF

  • 申请/专利权人 CANON INC;

    申请/专利号JP19960034893

  • 发明设计人 TAKEDA TOSHIHIKO;OYAMA JUNJI;

    申请日1996-02-22

  • 分类号B05D1/20;G11B9/00;

  • 国家 JP

  • 入库时间 2022-08-22 03:35:39

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