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VANADIUM OXIDE THIN FILM AND BOLOMETER TYPE INFRARED RAY SENSOR USING THIS FILM

机译:氧化钒薄膜和使用该薄膜的吸光度计型红外线传感器

摘要

PROBLEM TO BE SOLVED: To provide a vanadium oxide thin film, which has a temperature change factor of resistivity at the same degree with vanadium dioxide (VO2) in the vanadium oxide and which does not generate the metal - semi-conductor transition with a change of the crystal structure in a temperature from freezing point to 100°C or more, and to provide an infrared ray sensor, which can be used in the high temperature condition at 100°C or more without generating a crack and peeling, by using this thin film as the material for bolometer type infrared ray sensor. ;SOLUTION: In a vanadium oxide thin film obtained by reducing vanadium pentoxide, which is manufactured by spattering or sol-gel method and which is treated by heating in the air, with the argon-hydrogen mixture gas, in the case where vanadium oxide is expressed with VOx, range of the (x) satisfies 1.875(x)2.0. This thin film does not have metal-semi - conductor transition near 70°C unlike a typical VO2 thin film. This material is used for the material for bolometer type infrared ray sensor.;COPYRIGHT: (C)1997,JPO
机译:解决的问题:提供一种氧化钒薄膜,该薄膜具有与氧化钒中的二氧化钒(VO 2 )相同程度的电阻率温度变化系数,并且不产生金属-在从冰点到100℃或更高的温度下具有晶体结构变化的半导体转变,并提供一种红外线传感器,其可以在100℃或更高的高温条件下使用而不会产生通过将该薄膜用作辐射热计型红外线传感器的材料,从而产生裂纹和剥离。 ;解决方案:在通过还原五氧化二钒获得的氧化钒薄膜中,该五氧化二钒是通过溅射或溶胶-凝胶法制造的,并在空气中通过氩-氢混合气体在空气中加热处理的,如果氧化钒是用VO x 表示,(x)的范围满足1.875 <(x)<2.0。与典型的VO 2 薄膜不同,该薄膜在70°C附近没有金属半导体过渡。该材料用于辐射热计式红外线传感器的材料。; COPYRIGHT:(C)1997,JPO

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