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COMPOSITION FOR FORMING THIN BARIUM-STRONTIUM-TITANATE FILM
COMPOSITION FOR FORMING THIN BARIUM-STRONTIUM-TITANATE FILM
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机译:用于形成钛酸锶钡薄膜的组合物
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摘要
PURPOSE: To prevent the formation of carbonates at the time of thermal decomposition and crystallization and to form a crack-free thin dielectric film without a considerable weight change by mixing specified carboxylates with a titanium alkoxide in an org. solvent. CONSTITUTION: Barium salts and strontium salts of one or more kinds of carboxylic acids represented by the formula, R1 COOH (where R1 is 3-7C straight chain or branched alkyl), e.g. n-butyric acid and i-butyric acid (R1 is 3C alkyl), n-valeric acid and i-valeric acid (R1 is 4C alkyl), 2-ethylbutyric acid and n- hexanoic acid (R1 is 5C alkyl), n-heptanoic acid (R1 is 6C alkyl) and octylic acid (R1 is 7C alkyl) are mixed with one or more kinds of titanium alkoxzdes represented by the formula, Ti(OR2 )4 (where R2 is 1-7C straight chain or branched alkyl) in an org. solvent so as to regulate the molar ratio of Ba:Sr:Ta to (1-x):x:1 (0x1) and the concn. of the compds. to 5-15wt.%. The resultant compsn. giving desired Ba1-x Srx TiO3 is applied on a substrate and fired to obtain the objective thin dielectric film.
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