首页> 外国专利> Composition for an oxide thin film, a preparation method of the composition, a method for forming an oxide thin film using the composition, an electronic device including the oxide thin film, and a semiconductor device including the oxide thin film

Composition for an oxide thin film, a preparation method of the composition, a method for forming an oxide thin film using the composition, an electronic device including the oxide thin film, and a semiconductor device including the oxide thin film

机译:用于氧化物薄膜的组合物,该组合物的制备方法,使用该组合物形成氧化物薄膜的方法,包括该氧化物薄膜的电子器件以及包括该氧化物薄膜的半导体器件

摘要

Provided are a composition for an oxide thin film, a preparation method of the composition, a method for forming an oxide thin film using the composition, an electronic device including the oxide thin film, and a semiconductor device including the oxide thin film. The composition for the oxide thin film includes a metal precursor and nitric acid-based stabilizer. The metal precursor includes at least one of a metal nitrate, a metal nitride, and hydrates thereof.
机译:提供用于氧化物薄膜的组合物,该组合物的制备方法,使用该组合物形成氧化物薄膜的方法,包括该氧化物薄膜的电子器件以及包括该氧化物薄膜的半导体器件。氧化物薄膜用组合物包含金属前体和硝酸系稳定剂。金属前体包括金属硝酸盐,金属氮化物及其水合物中的至少一种。

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