HIGH SURFACE REGION SUBSTRATE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a high surface region substrate by placing a mask on a substrate, depositing at least two different members at the same time through the mask to form a deposit region and selectively removing one member of the deposited members. ;SOLUTION: A substrate 10 is fixed in place, a mask 12 having openings 13 is disposed accurately at a position on the substrate 10, a Ni and Al powders are injected into a plasma and deposited on the substrate 10, the covered substrate 10 is dipped in an alkaline soln. to dissolve Al, thereby forming a porous Ni-covered substrate. At this step, the relative size of the Ni powder to the Al powder, the relative feed rate, and the physical or chemical properties of both powders are controlled to control the size, the surface area and the substrate of the pores of the porous Ni-covered substrate whereby a high surface metal or metallized high surface region substrate can be obtained.;COPYRIGHT: (C)1997,JPO