PHASE SHIFT EXPOSURE MASK AND EXPOSURE METHOD USING PHASE SHIFT EXPOSURE MASK

摘要

PROBLEM TO BE SOLVED: To provide a phase shift exposure mask and an exposure method using the phase shift exposure mask by which a practical bottleneck such as decrease in the depth of focus is not caused but its performance can be enough made use of. SOLUTION: A light-shielding film 2 is formed on a transparent substrate 1 such as quartz to form a semi light-shielding part 3 and a light-transmitting part 4. Moreover, this structure is formed in such a manner that the phase of transmitted light through the semi light-shielding part 3 is different from the phase of the light through the light-transmitting part 4. A diffraction pattern 5 to diffract transmitted light is formed on the opposite surface of the substrate to the surface where the light-shielding film 2 is formed. By using the phase shift exposure mask having this structure, exposure light P is made to irradiate through the exposure diffraction pattern 5.