Multilayer film refractor null for x-ray or vacuum ultraviolet ray

摘要

PURPOSE:To obtain a multi-layer reflecting mirror for an X ray and a vacuum ultraviolet ray having a reflectivity as high as an approximate theoretical value and excellent thermal resistance and chemical stability, by constituting a layered film of one or more layers with a crystallized substance. CONSTITUTION:A reflecting mirror is formed with a crystallized layered film so as to keep a specific performance to the reflecting mirror even though locally heated by a highly intensive incident ray. That is; for example, such a mirror is formed with a multi-layer lamination of an Ru as a low refraction index material and an Si as a high refraction index material alternatively by an ion vacuum evaporation, on a polished molten-quartz base plate. Therewith such mirror has not only a refraction index higher than that of an amorphous layer for a radiation ray within a wave length zone of a soft X ray and a vacuum ultraviolet ray, but also can not be damaged in its mirror body against an irradiation of a highly intensive ray such as a synchrotron orbital radiation, and subsequently has a high durability against a long term continuous irradiation.