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Block oligomers containing 2,2,6,6-tetramethyl-4-piperidyl groups as stabilizers for organic materials

机译:包含2,2,6,6-四甲基-4-哌啶基的嵌段低聚物作为有机材料的稳定剂

摘要

Compounds of the formula (I)in which the polydispersity {overscore (M)}w/{overscore (M)}n is 1; n is 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14 or 15; the radicals R1 are for example hydrogen or C1-C8alkyl; R2 is for example C2-C12alkylene; the radicals A are independently of one another -OR3, -N(R4)(R5) or a group of theR3, R4 and R5, which are identical or different, are for example hydrogen or C1-C18alkyl, or -N(R4)(R5) is additionally a group of the formulawith Y being -O-, -CH2-, -CH2CH2- or N-CH3; X is -O- or N-R6; R6 is for example hydrogen or C1-C18alkyl; R is preferably a group of the formulaand the radicals B have independently of one another one of the definitions given for A; with the proviso that in the individual recurrent units of the formula (I), each of the radicals B, R, R1 and R2 has the same or a different meaning, are useful as light stabilizers, heat stabilizers and oxidation stabilizers for organic materials, in particular synthetic polymers.
机译:式(I)的化合物,其中多分散性{overscore(M)} w / {overscore(M)} n为1; n为3、4、5、6、7、8、9、10、11、12、13、14或15;基团R1是例如氢或C1-C8烷基; R 2例如是C 2 -C 12亚烷基;基团A彼此独立地是-OR 3,-N(R 4)(R 5)或相同或不同的R 3,R 4和R 5的基团,例如氢或C 1 -C 18烷基,或-N(R 4)。 (R5)另外是式的基团,其中Y是-O-,-CH2-,-CH2CH2-或> N-CH3; X为-O-或> N-R6; R6是例如氢或C1-C18烷基; R优选为下式的基团,并且基团B彼此独立地具有对于A给出的定义;前提是在式(I)的各个重复单元中,基团B,R,R1和R2具有相同或不同的含义,可用作有机材料的光稳定剂,热稳定剂和氧化稳定剂,特别是合成聚合物。

著录项

  • 公开/公告号NO965150L

    专利类型

  • 公开/公告日1997-06-05

    原文格式PDF

  • 申请/专利权人 CIBA SC HOLDING AG;

    申请/专利号NO19960005150

  • 发明设计人 BORZATTA VALERIO;GUIZZARDI FABRIZIO;

    申请日1996-12-03

  • 分类号C08K5/3462;C08K5/3492;C07D401/12;

  • 国家 NO

  • 入库时间 2022-08-22 03:26:17

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