Projection exposure apparatus. A method of correcting a positional shift of a projected image and a method of obtaining an imaging characteristic of a projection optical system

摘要

An object of the present invention is to correct a positional deviation of an image of a partial area due to elongation and contraction in the Y direction of a substrate by changing the magnification of each projection optical system and the slope of the parallel flat glass with respect to the optical axis, It is possible to confirm whether or not the positional shift correction is sufficiently performed by accurately detecting the shift using the adjustment system of the projection optical system. If the correction is insufficient as a result of the confirmation, at least one of the magnification correction of each projection optical system and the phase shift projected onto the substrate 4 by each projection optical system is re-executed so that the amount of deviation of the position is sufficiently small. Further, positional deviation can be easily obtained by processing the position information and the image detection signal by the projection optical system in synchronization with the clock.