Dissolution Inhibitors for Chemically Amplified Resist

摘要

The dissolution inhibitor for chemically amplified resists which is an inositol derivative represented by the following structural formula (I).;Wherein R is H or a t-butyloxycarbonyl group (t-BOC), at least two of said R being t-BOC.;Such dissolution inhibitors for chemically amplified resists can easily control the minute solubility difference in the resist, thereby greatly improving the contrast of the resist.;have.