METHOD FOR DEVELOPING RESIST AND RINSING SOLUTION USED AFTER SAME

摘要

PROBLEM TO BE SOLVED: To provide a method for developing a resist by which the breaking of a pattern is suppressed and practical resolution is enhanced at the time of forming a pattern with a ZEP resist (R). ;SOLUTION: A ZEP resist (R) a nanocomposite resist to which Buck- minsterfullerence (R) has been added is applied on a substrate, baked and exposed with electron beams. The substrate is then immersed in a developing solvent to carry out development, the solvent is washed off by rinsing with a perfluorocarbon solvent such as perfluoropentane, perfluorohexane or perfluoroheptane and the substrate is dried.;COPYRIGHT: (C)1998,JPO