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METHOD FOR EVALUATING CHARACTERISTIC OF SUBSTANCE BASED ON PROGRAMMED TEMPERATURE DESORPTION SPECTRAL METHOD AND METHOD FOR FORMING SEMICONDUCTOR INSULATING FILM USING THE SAME
METHOD FOR EVALUATING CHARACTERISTIC OF SUBSTANCE BASED ON PROGRAMMED TEMPERATURE DESORPTION SPECTRAL METHOD AND METHOD FOR FORMING SEMICONDUCTOR INSULATING FILM USING THE SAME
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机译:基于程序温度解吸谱法的物质特性评估方法和利用该方法形成薄膜的半导体绝缘体的方法
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摘要
PROBLEM TO BE SOLVED: To quickly and easily evaluate a structural characteristic of a substance by forming models of a diffusion process from the interior of the substance of chemical species to the vicinity of a surface and a surface desorption process, e.g. stripping, accumulation, gas phase emission, etc., and combining the models with a programmed temperature desorption spectrum. ;SOLUTION: Models of a diffusion process and a surface desorption process are represented respectively by formulae I and II wherein T is a temperature, (t) is a time, (x) is a distance in a thicknesswise direction, (c) is a concentration of chemical species, D is a diffusion coefficient, Do,i is a prediffusion exponential term, Ed,i is a diffusion activation energy, kB is a Boltzmann factor, (k) is a desorption reaction speed constant, cs is a surface accumulation amount, (n) is a desorption reaction degree, fj is a surface coverage rate, Ao,j is a predesorption exponential term, and Ea,j is a desorption activation energy. A sample 11 is heated by a heater 14. The temperature T obtained by a temperature control device 16 and the amount of chemical species in a generated gas which is detected by a quadruple mass spectrometer 21 are stored as an actually measured programmed temperature desorption spectrum in a memory device 33. A calculator 34 carries out fitting with the use of the spectrum according to the method of least squares, determines each parameter of the formulae I, II and displays at a display device 32.;COPYRIGHT: (C)1998,JPO
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机译:解决的问题:通过形成从化学物质的内部到表面附近的扩散过程和表面解吸过程的模型,可以快速,轻松地评估物质的结构特征。汽提,积累,气相排放等,并将模型与已编程的温度解吸谱结合起来。 ;解决方案:扩散过程和表面解吸过程的模型分别由公式I和II表示,其中T是温度,(t)是时间,(x)是沿厚度方向的距离,(c)是a化学物种的浓度,D是扩散系数,D o Sub>, i Sub>是预扩散指数项,E d Sub>, i < / Sub>是扩散活化能,kB是玻尔兹曼因子,(k)是解吸反应速度常数,c s Sub>是表面累积量,(n)是解吸反应度,f j Sub>是表面覆盖率,A o Sub>, j Sub>是预解吸指数项,E a Sub>,< Sub> j Sub>是解吸活化能。样品11被加热器14加热。由温度控制装置16获得的温度T和由四重质谱仪21检测到的所产生的气体中的化学物质的量被存储为实际测量的程序温度解吸谱。计算器34根据最小二乘法对光谱进行拟合,确定公式I,II的每个参数并显示在显示设备32上。版权:(C)1998,日本特许厅
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