FORMATION OF SIC THIN COATING ON HIGH POLYMER SUBSTRATE BY PLASMA CVD AND DEVICE THEREFOR

摘要

PROBLEM TO BE SOLVED: To thinly deposit transparent SiC coating on the surface of plastics and to improve the surface hardness without deteriorating the designing properties thereof by utilizing ECR plasma CVD technology capable of low temp. deposition of coating of high quality. ;SOLUTION: The magnetic field is applied to the inside of a plasma generating chamber 1 by magnetic coils 2 arranged around the plasma generating chamber 1, microwaves are introduced into the plasma generating chamber, an upstream gas is introduced into the plasma generating chamber to generate ECR plasma, a downstream gas is fed thereto from an introducing port 6, and furthermore, the ECR plasma is passed through meshes 14 set between the introducing port 6 and the high polymer substrate 7 or between the plasma generating chamber and the introducing port, by which SiC coating is deposited on the surface of the high polymer substrate.;COPYRIGHT: (C)1998,JPO