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INORGANIC MATTER SEAL FOR CAPSULING ORGANIC MATTER LAYER AND ITS FORMATION

机译:用于封装有机物层的无机物密封剂及其形成

摘要

PROBLEM TO BE SOLVED: To reduce a time and a cost when compared with a conventional method and make possible edge seal of high density since additional masks and employment of wet type etching are not required by providing an inorganic insulator seal for capsule sealing of a layer of an organic insulator between a first layer of an inorganic insulator and a second layer of an inorganic insulator. SOLUTION: In a constitution in which an inorganic insulator layer 12 and an organic polymide layer 13 are attached on a passivation layer (organic polyimide layer) 10 including metallic coating rings M3, S2, M2, S1, M1, after an opening attaining the metallic coating ring M3 and an edge seal channel region 15 are opened, an inorganic matter layer 16 is attached by CVD conformal deposition. Then, the inorganic matter layer 16 is etched by RIE, a seal is formed and the organic matter layer 10 is subjected to capsule sealing by inorganic matter such as SiO2 12, 16, 20. Thereby, even if a wafer is cut during a following treatment, transportation and stacking, the passivation layer 10 does not peel from the inorganic matter layer 20 and a metallic pat region.
机译:解决的问题:与常规方法相比,减少了时间和成本,并可能进行高密度的边缘密封,因为通过提供无机绝缘体密封层进行胶囊密封不需要额外的掩膜和湿式蚀刻在无机绝缘体的第一层和无机绝缘体的第二层之间的有机绝缘体的结构。解决方案:在无机物绝缘层12和有机聚酰亚胺层13附着在钝化层(有机聚酰亚胺层)10上的结构中,该钝化层包括金属涂层环M3,S2,M2,S1,M1,打开涂层环M3和边缘密封通道区域15,通过CVD保形沉积附着无机物层16。然后,通过RIE蚀刻无机物层16,形成密封,并且通过诸如SiO 2 12、16、20的无机物对有机物层10进行胶囊密封。由此,即使在随后的过程中切割晶片也是如此。在处理,运输和堆叠的情况下,钝化层10不会从无机物层20和金属拍打区域剥离。

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