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COMPOSITION FOR FORMING POSITIVE METAL SULFIDE THIN FILM PATTERN AND METHOD FOR FORMING POSITIVE METAL SULFIDE THIN FILM PATTERN
COMPOSITION FOR FORMING POSITIVE METAL SULFIDE THIN FILM PATTERN AND METHOD FOR FORMING POSITIVE METAL SULFIDE THIN FILM PATTERN
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机译:形成正金属硫化物薄膜图案的组合物和形成方法
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PROBLEM TO BE SOLVED: To form a good positive metal sulfide thin film pattern by a sol-gel method by incorporating a stabilizer generating agent forming a metal alkoxide stabilizer by photoirradiation. ;SOLUTION: A metal alkoxide is the raw material for a metal sulfide, and a lower alkoxide such as the ethoxide, propoxide, isopropoxide, butoxide and isobutoxide of the metal of the metal sulfide to be formed is appropriately used. The metal alkoxide and a stabilizer generating agent forming a metal alkoxide stabilizer by photoirradiation are incorporated into the composition for forming a positive metal sulfide thin film pattern. As a result, only the light-irradiated part is dissolved off when the composition is developed after photoirradiation, the unirradiated part is left, and a positive metal sulfide thin film pattern is formed.;COPYRIGHT: (C)1997,JPO
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