PURPOSE: To form a rigid fullerene thin film by providing a process for forming the fullerene thin film on a substrate and a process for polymerizing the fullerene by the irradiation of light energy to prevent the detachment or movement of the fullerene from the substrate. CONSTITUTION: The fullerene is made of carbons bonded into a basket state having single bonds and double bonds between carbons. When the fullerene is irradiated with light at the wavelength of about 300nm, a part of the double bonds is broken to bond fullerene molecules to each other. As a result, several numbers of fullereene molecules are cross-linked, and then, fullerene is fixed and so prevented from the detachment from the substrate or the movement on the substrate. In the figure, after a monomolecular layer of C60 is vapor deposited on the (001) plane of a molybdenum disulfide substrate 2 kept at 200 deg.C from a vapor deposition cell 1 under vacuum, a shutter 3 is closed and ultraviolet ray at the wavelength of 300nm is applied through a viewing port 4 for 1min from a ultraviolet lamp 5. The work of vapor depositing the monomolecular layer of C60 and irradiating with light is repeated 100 times.
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