首页> 外国专利> Procedure for polishing elements in marble, granite or hard stone in general and associated device

Procedure for polishing elements in marble, granite or hard stone in general and associated device

机译:一般及相关设备中大理石,花岗岩或硬石中元素抛光的步骤

摘要

Procedure for polishing elements in marble, granite or hard stones in general, associated with a device comprising a plurality of polishing stations 14 arranged in line and cooperating with a conveyor means 11 which advances in a substantially linear manner and feeds the piece to polish 13 between said stations 14, the procedure envisaging at least one phase 20 for reading and/or recognising the profile of the piece to polish 13 upstream from the first polishing station 14a and at least one phase 23 for washing and drying the polished surface downstream from the last polishing station 14b, the procedure being managed by a drive and control unit 17, at least downstream from the washing and drying phase 23, envisaging an in-line phase 24 for measuring the degree of brilliance of at least part of the surface of the polished piece 13 with consequent parameterisation of the brilliance value measured, said measurement phase 24 being associated at least with means for identifying the brilliance result obtained. Device for polishing elements in marble, granite or hard stones in general, comprising a plurality of polishing stations 14 arranged in line and cooperating with a conveyor means 11 which advances in a substantially linear manner and feeds the piece to polish 13 between said stations 14, the device comprising at least means 15 for reading and/or recognising the profile of the piece to polish 13 located upstream from the first polishing station 14a, and at least means of washing 18 and drying 19 the polished surface located downstream from the last polishing station 14b, said polishing device 10 having at least one drive and control unit 17 set up for the management and operation of the polishing device, comprising at least one unit 25 for measuring the degree of brilliance of at least part of the surface of the polished piece 13, located in line and downstream from said means of washing 18 and drying 19, said measurement unit 25 being associated with said drive and control unit 17 for providing at least one parameterised value corresponding to the brilliance value of said surface of the polished piece 13. IMAGE
机译:一般地,用大理石,花岗岩或硬石对元件进行抛光的程序,该装置与包括多个布置成一直线并与传送装置11配合的抛光站14的装置相关联,该传送装置以大致线性的方式前进并将工件馈送到抛光装置13之间所述工位14,该程序设想至少一个阶段20以读取和/或识别要在第一抛光工位14a上游进行抛光的工件的轮廓13,以及至少一个阶段23以清洗和干燥最后一个工件下游的抛光表面抛光台14b,该程序由驱动和控制单元17至少在洗涤和干燥阶段23的下游来管理,设想在线阶段24用于测量至少一部分抛光表面的光彩度。部件13,随后测量的亮度值被参数化,所述测量阶段24至少与用于识别亮度的装置相关联获得的结果。通常,用于对大理石,花岗岩或硬石中的元件进行抛光的装置,包括多个排列成一直线并与传送装置11配合的抛光站14,该传送装置以大致线性的方式前进,并将工件馈送到所述站14之间的抛光13中。该设备至少包括位于第一抛光工位14a上游的用于读取和/或识别待抛光工件的轮廓的装置15,以及至少清洗和干燥位于最后一个抛光工位下游的抛光表面19的装置18。如图14b所示,所述抛光装置10具有至少一个用于控制和操作抛光装置的驱动和控制单元17,包括至少一个用于测量抛光件的至少一部分表面的光辉度的单元25。如图13所示,位于所述洗涤装置18和干燥装置19的下游并位于其下游,所述测量单元25与所述驱动和控制单元17相关联,用于提供至少一个对应于抛光片13的所述表面的亮度值的参数化值。

著录项

  • 公开/公告号IT1280179B1

    专利类型

  • 公开/公告日1998-01-05

    原文格式PDF

  • 申请/专利权人 EIDON RICERCA SVILUPPO DOCUMENTAZIONE SPA;

    申请/专利号IT1995UD00103

  • 发明设计人 LAZZATI MARCO;

    申请日1995-05-30

  • 分类号

  • 国家 IT

  • 入库时间 2022-08-22 02:55:43

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号