Sputter-resistant, low-work-function, conductive coatings for cathode electrodes in DC plasma addressing structure

摘要

A refractory compound coating (188) for electrodes is sputter resistant, has a low work function so that it is a good emitter of secondary electrons, is very resistant to oxidation, and is easy to apply by way of electrophoresis. More specifically, cathode electrodes (162) are used in a plasma addressing structure (10). The coating is preferably formed by electrophoretic deposition of particles (184) of at least one refractory compound along with a frit. The coating is subsequently baked to fuse the frit and bond the electrophoretically deposited particles to the electrodes.