PROCESS OF MANUFACTURE OF PHOTOSENSITIVE, RESISTIVE AND OPTICALLY NONLINEAR COMPOSITION FILMS BASED ON HIGH AND LOW REFRACTIVE MATERIALS

摘要

FIELD: microelectronics, manufacture of film structures. SUBSTANCE: proposed process consists in evaporation or spraying of multicomponent target of starting materials in vacuum and in deposition of film-forming material on backing. Film coat on backing is fabricated in the form of layer of material of low refractive index n_l.r.i and monocrystals formed from material with high refractive index n_h.r.i sprinkled into it so that n_h.r.i n_l.r.i and having diameter d found from relation 0,2a_odλ_l, where a_o,λ_l are first Bohr radius of exciton and length of free path of electron of starting high-refractive material. Target manufactured from homogeneous ultrafine dispersive powders is used as multicomponent target during evaporation or spraying. Volumetric ratio of high-refractive and low-refractive materials of multicomponent target is chosen on condition of manufacture of predicted volumetric concentration of monocrystals of high-refractive material in volume of layer of low-refractive material. EFFECT: enhanced efficiency and productivity of process. 3 cl, 9 dwg, 1 tbl