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Extended wavelength strained layer lasers having short period superlattices

机译:具有短周期超晶格的扩展波长应变层激光器

摘要

Several methods are used in novel ways with newly identified and viable parameters to decrease the peak transition energies of the pseudomorphic InGaAs/GaAs heterostructures. These techniques, taken separately or in combination, suffice to permit operation of light emitting devices at wavelengths of 1.3 &mgr;m or greater of light- emitting electro-optic devices. These methods or techniques, by example, include: (1) utilizing new superlattice structures having high In concentrations in the active region, (2) utilizing strain compensation to increase the usable layer thickness for quantum wells with appropriately high In concentrations, (3) utilizing appropriately small amounts of nitrogen (N) in the pseudomorphic InGaAsN/GaAs laser structure, and (4) sue of nominal (111) oriented substrates to increase the usable layer thickness for quantum wells with appropriately high In concentrations. In all of the above techniques, gain offset may be utilized in VCSELs to detune the emission energy lower than the peak transition energy, by about 25 meV or even more, via appropriate DBR spacing. Gain offset may also be utilized in some forms of in-plane lasers. Increased temperature may also be used to decrease peak transition energy (and therefore the emission energy) by about 50 meV/100° C. All these techniques are furthermore applicable to other material systems, for example, extending the emission wavelength for laser diodes grown on InP substrates. Additionally, structures which utilize the above techniques are discussed.
机译:以新颖的方式使用了几种方法,这些方法具有新近确定且可行的参数,可降低假晶InGaAs / GaAs异质结构的峰跃迁能。单独地或组合地使用这些技术足以允许发光器件在发光电光器件的1.3μm或更大的波长下操作。例如,这些方法或技术包括:(1)在有源区中使用具有高In浓度的新超晶格结构,(2)利用应变补偿来增加In浓度适当高的量子阱的可用层厚度,(3)在拟态InGaAsN / GaAs激光结构中使用适当少量的氮(N),以及(4)使用标称(111)取向的衬底,以增加In浓度适当高的量子阱的可用层厚度。在所有上述所有技术中,可以通过适当的DBR间隔在VCSEL中利用增益偏移来将比峰值跃迁能量低约25 meV甚至更高的发射能量失谐。增益偏移也可以用于某些形式的平面激光器中。升高的温度还可以用于将峰值跃迁能量(以及因此的发射能量)降低约50 meV / 100°C。所有这些技术还适用于其他材料系统,例如,扩展在其上生长的激光二极管的发射波长InP基板。另外,讨论了利用以上技术的结构。

著录项

  • 公开/公告号US5719895A

    专利类型

  • 公开/公告日1998-02-17

    原文格式PDF

  • 申请/专利权人 PICOLIGHT INCORPORATED;

    申请/专利号US19960721769

  • 发明设计人 HENRYK TEMKIN;JACK L. JEWELL;

    申请日1996-09-25

  • 分类号H01S3/103;

  • 国家 US

  • 入库时间 2022-08-22 02:40:09

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