MASK STRUCTURAL BODY, EXPOSURE METHOD AND EXPOSURE DEVICE USING THIS MASK STRUCTURAL BODY, SEMICONDUCTOR DEVICE MANUFACTURED BY USING THIS MASK STRUCTURAL BODY AND PRODUCTION OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To decrease the number of washing times of a mask or eliminating the need for washing while preventing adhesion and deposition of stains onto a mask surface and to prolong the life of the mask by providing the mask surface or the surface of the pellicle mounted on the mask with a thin film of titanium oxide. ;SOLUTION: The front surface side pellicle 7 stuck onto a frame 6 is mounted at a reinforcing body 4. The titanium oxide film 14 is formed by resistance heating vapor deposition or electron beam vapor deposition on the front surface side pellicle 7. The rear surface side pellicle 11 stuck to a frame 10 is mounted at the flank of the reinforcing body 4. The titanium oxide film 15 is formed on the front surface of the rear surface side pellicle 11. The titanium oxide films 14, 15 act as photocatalysts to decompose the contaminants sticking to the pellicles 7, 11 at the time of exposure with X-rays or by irradiation with auxiliary light. Further, the titanium oxide is photoconductive and is conducted by the exposure or the irradiation with the auxiliary light, by which the adhesion of the dust, etc., onto the pellicles 7, 11 is prevented.;COPYRIGHT: (C)1999,JPO