SCANNING TYPE EXPOSURE SYSTEM AND MEASURING METHOD OF VISUAL FIELD STOP POSITION

摘要

PROBLEM TO BE SOLVED: To prevent an irregular exposure from occurring in a scanning type exposure system by a method wherein a means which measures the position of a visual field stop is provided, and projection optical systems which project an image of a mask pattern joining exposure regions together for exposure are corrected on positional deviation of a visual field stop. ;SOLUTION: The shape of a slit 20a provided to a slit plate 20 is scanned keeping the visual field stops 45 of projection optical systems stationary to measure the position of the visual field stops 45. That is, the edge position of the opening 45a of a visual field stop 45 is obtained resting on the position of a slit 20a obtained by a laser interferometer 57, a position where a photodetector sensor 50 varies in output and an ideal edge position of a visual field stop are compared with each other, whereby the deviation of the edge position of the opening 45a of the visual field stop 45 is detected, and the visual field stop 45 is corrected on a positional deviation by a visual field stop drive mechanism 56. By this setup, irregular exposure can be prevented from occurring.;COPYRIGHT: (C)1999,JPO