CHEMICAL VAPOR DEPOSITION FOR SINGLE WAFER AND QUARTZ PIN LIFT FOR ETCHING PROCESS CHAMBER

摘要

PROBLEM TO BE SOLVED: To provide a wafer carrier apparatus which includes a susceptor for providing uniform heating and thermal uniformity or thermal distribution through the entire susceptor, to thereby realize uniform heating and thermal distribution over an entire processing semiconductor wafer. ;SOLUTION: A wafer carrier apparatus 200 includes a susceptor 208 having a surface on which a wafer 205 is carried on its rear side. The susceptor 208 has a plurality of guide recesses 212. The apparatus 200 also includes a pin lift 224 having a plurality of pins extended therefrom. The plurality of pins are arranged so as to be passed through the plurality of guide recesses 212 of the susceptor 208 and be engaged with the bottom side of the wafer 205. The suceptor 208 is arranged to be moved in a direction substantially perpendicular to the plane of the susceptor with respect to the plurality of pins.;COPYRIGHT: (C)1998,JPO