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Method for inactivating a light-receiving surface of a substrate of an indium-antimony photodetector and indium-antimony photodetector

机译:使铟锑光电探测器的基板的光接收表面失活的方法和铟锑光电探测器

摘要

The light receiving or back-side surface (22) of an indium antimonide (InSb) photodetector device (10) substrate (12) is cleaned to remove all oxides of indium and antimony therefrom. Passivation and/or partially visible light blocking layers (26, 28) are then formed thereon of a material which does not react with InSb to form a structure which would have carrier traps therein and cause flashing. The optical cutoff wavelength and thickness of the partially visible light blocking layer (28) are selected to suppress the avalanche effect in the device (10) at visible wavelengths. This enables the device (10) to operate effectively over a wide wavelength range including the visible and infrared bands. The passivation and/or partially visible light blocking layers (26, 28) may be a thin layer of a semiconductor such as germanium, or silicon dioxide and/or silicon nitride followed by a partially visible light blocking silicon layer.
机译:清洁锑化铟(InSb)光电检测器装置(10)基板(12)的光接收面或背面(22),以从中去除铟和锑的所有氧化物。然后在其上形成不与InSb反应的材料形成钝化和/或部分可见的光阻挡层(26、28),以形成在其中具有载流子陷阱并引起闪烁的结构。选择光学截止波长和部分可见光阻挡层(28)的厚度以抑制器件(10)在可见波长下的雪崩效应。这使得装置(10)能够在包括可见和红外波段的宽波长范围内有效地操作。钝化和/或部分可见光阻挡层(26、28)可以是半导体的薄层,例如锗,二氧化硅或氮化硅,然后是部分可见光阻挡硅层。

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