Process for the preparation of partially reduced sputter targets for cathode sputtering based on indium oxide-tin oxide-powder mixtures and targets thus produced

摘要

A process for mfg. a part-reduced sputter target for cathodic sputtering on the basis of indium oxide-tin oxide powder mixts. by means of pressure supported sintering is novel in that the tin-contg. component is at least partly formed from SnO and together with the In2O3 is subjected to a mixing treatment before compressing. Also claimed is a process for mfg. a part-reduced sputter target for cathodic sputtering on the basis of indium oxide-tin oxide powder mixts. by means of pressure supported sintering is novel in that the tin-contg. component is completely formed from SnO and together with SnO2 and In2O3 is subjected to a mixing treatment before compressing. Also claimed is a part-reduced sputter target for mfg. transparent electrically-conducting layers comprising a target mfd. by one of the above methods.