首页> 外国专利> High Frequency Induction Plasma Torch for Vapor Synthesis and Thin Film Coating of Diamond and Non-oxide Ceramic Powders

High Frequency Induction Plasma Torch for Vapor Synthesis and Thin Film Coating of Diamond and Non-oxide Ceramic Powders

机译:高频感应等离子体炬,用于金刚石和非氧化物陶瓷粉末的蒸汽合成和薄膜涂层

摘要

The present invention is excellent in thermal conductivity, extremely low electrical conductivity, corrosion resistance and high hardness, synthesized with non-oxide ceramic powder including diamond or metal nitride, or semiconductor type thin film coating or cutting tool bite tightly and firmly It relates to the structure and application of high frequency induction plasma torch.;In order to synthesize high quality diamond powder, non-oxide ceramic powder including metal nitride, or these thin films, this plasma torch may be installed in a vacuum chamber, and mass production may be performed in air.;Liquid nitrogen purge method is selected to obtain non-oxide ceramic powder including powdered diamond or metal nitride.;And this reaction torch is an electrodeless torch adopting the method of generating high frequency induction plasma, so that the wear of the electrode does not occur and has the excellent durability.
机译:本发明具有优异的导热性,极低的导电性,耐腐蚀性和高硬度,是由包括金刚石或金属氮化物的非氧化物陶瓷粉末或半导体类薄膜涂层或切削工具紧密牢固地合成而成的。为了合成高质量的金刚石粉末,包括金属氮化物的非氧化物陶瓷粉末或这些薄膜,可以将该等离子炬安装在真空室内,并可以批量生产。选择液态氮吹扫法以获得包括粉末状金刚石或金属氮化物的非氧化物陶瓷粉末;并且该反应炬是一种无电极炬,采用产生高频感应等离子体的方法,因此磨损电极不会出现,并且具有极好的耐久性。

著录项

  • 公开/公告号KR19990003725A

    专利类型

  • 公开/公告日1999-01-15

    原文格式PDF

  • 申请/专利权人 지종기;

    申请/专利号KR19970027663

  • 发明设计人 지종기;

    申请日1997-06-21

  • 分类号C23C16/30;

  • 国家 KR

  • 入库时间 2022-08-22 02:18:14

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