MECHANICAL PROPERTIES OF RADIO FREQUENCY PLASMA ASSISTED CHEMICAL VAPOR DEPOSITED DIAMOND-LIKE CARBON(DLC)THIN FILMS

摘要

In this study we investigated the influence of process parameters, including deposition time, on the nanomechanical properties of diamond-like carbon(DLC)thin films. The DLC films were deposited using the Radio Frequency Plasma Assisted Chemical Vapor Deposition(RF PACVD)process. The study included samples prepared using various bias voltages, in a Methane and/or Argon atmosphere, using deposition times of 3 and 4 minutes. The films fabricated using the 3 minute deposition time were generally found to have more consistent mechanical properties throughout the film thickness compared to the ones fabricated using the 4 minute deposition time although these properties tend to be slightly lower than for the 4 minute data. We also report hardness and modulus simulation results of the DLC thin films.