Electron Beam Lithography Method Using Optical Enhanced Electron Emission

摘要

Disclosed is an electron beam lithography method using optically enhanced electron emission which emits an electron beam while irradiating light onto a field emitter. This method is an electron beam lithography method using optical enhancement electron emission in which a photoresist film laminated on a substrate is exposed using an electron beam emitted from a field emitter, wherein the field emitter is irradiated with light to turn on the turn-on voltage of the field emitter. Lowering and increasing the current density is characterized in that it further comprises.