ELECTRON BEAM EMISSION SOURCE, MANUFACTURING METHOD OF ELECTRON BEAM EMISSION SOURCE AND ELECTRON BEAM LITHOGRAPHY SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide an electron beam emission source with a smaller electron emission angle, having a structure easy to join a nanotube, to provide a manufacturing method of the electron beam emission source, and to provide an electron beam lithography system with a smaller electron beam diameter and capable of exposing a micropattern.;SOLUTION: The electron beam emission source has a protrusion 3 with a conductivity on a board 1, and part other than the tip part 3a is covered with an insulator 2, and a carbon nanotube 4 is jointed with the tip part 3a of the protrusion 3.;COPYRIGHT: (C)2004,JPO