首页> 外国专利> 'A high-frequency plasma process in which the plasma is excited by an inductive structure in which the phase and the inverse-phase portion of the capacitive current between the inductive structure and the plasma are balanced

'A high-frequency plasma process in which the plasma is excited by an inductive structure in which the phase and the inverse-phase portion of the capacitive current between the inductive structure and the plasma are balanced

机译:“高频等离子体工艺,其中等离子体由感应结构激发,其中感应结构与等离子体之间的电容性电流的相位和反相部分处于平衡状态

摘要

It is the process of manufacturing the product. The process includes exposing the substrate to a composition of an entity, wherein at least one of the entities is coupled to a voltage of the inductive coupling structure by a high frequency field in which the vector sum of capacitively coupled phase and reverse phase is substantially balanced It emits from the chemical species produced by the excited gas discharge.
机译:这是制造产品的过程。该方法包括将衬底暴露于实体的组合物,其中至少一个实体通过高频场耦合到感应耦合结构的电压,在高频场中,电容耦合相和反相的矢量和基本平衡。它从激发气体放电产生的化学物质中释放出来。

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