Chemical liquid supply nozzle of semiconductor wafer automatic cleaning device

摘要

The present invention relates to a chemical liquid supply nozzle of an automatic semiconductor wafer cleaning apparatus, and the present invention is provided in a chemical liquid supply nozzle which is installed on the upper part of the process chamber and is provided with a chemical liquid injection tube made of 3/8 inch Teflon diameter. The end diameter of the chemical liquid injection tube is characterized in that formed after the injection of the chemical liquid on the wafer is smaller than 3/8 inches in order not to fall back so that the remaining liquid liquid drops.;Therefore, according to the present invention, when the pure water cleaning or the chemical liquid injection is finished in the chemical liquid injection tube, it is possible to prevent the phenomenon that the remaining chemical liquid drops fall onto the wafer without being completely finished.