Substrate disc processing apparatus for simulation of silicon micro process

摘要

The apparatus supports a substrate disc (7) in a reaction chamber (1) via a disc holder (5), with a convection plate (3) positioned above the substrate disc and rotated together with the disc holder. The disc may be of monocrystalline silicon, an SOI water, a glass water, or a plastics water. Also provided in the chamber is a heater (2) above the connection plate. A second convection plate (4) similarly rotated with the disc holder may lie on the opposite side of the latter, so that the substrate disc is positioned between the two convection plates.