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Phase shifting mask and process for forming comprising a phase shift layer for shifting two wavelengths of light
Phase shifting mask and process for forming comprising a phase shift layer for shifting two wavelengths of light
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机译:相移掩模及其形成方法,其包括用于使两个波长的光移位的相移层
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摘要
A phase shifting mask can be used with exposure lights of two different wavelengths. The depth of the phase shifting layer is calculated and fabricated such that it shifts a first exposure light about 180° and a second exposure light about 180°.
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