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Structure of phase shifting mask and method of manufacturing the same comprising an adhesive layer between a phase shift layer and a light blocking layer
Structure of phase shifting mask and method of manufacturing the same comprising an adhesive layer between a phase shift layer and a light blocking layer
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机译:相移掩模的结构及其制造方法,包括在相移层和遮光层之间的粘合剂层
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摘要
The structure of a phase shift mask and a method of manufacturing the same are disclosed. A phase shifting mask in accordance with the present invention comprises a light transmitting substrate, a phase shifting layer formed on the upper side of the light transmitting substrate, an adhesive layer formed on the phase shifting layer, and a light shielding layer formed on the adhesive layer. Accordingly, when etching the phase shifting layer, the light shielding layer is protected by the adhesive layer. The adhesive strength is increased due to the adhesive layer formed between the phase shifting layer and the light shielding layer, thereby much improving the reliability of the phase shifting mask.
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