METHOD FOR FORMATION OF SCATTERING FACE, PRODUCTION OF LIQUID CRYSTAL DISPLAY DEVICE AND ELECTRONIC APPLIANCE

摘要

PROBLEM TO BE SOLVED: To selectively form a reflective face having good scattering characteristics on the surface of a glass substrate or semiconductor substrate. ;SOLUTION: This method for the formation of a scattering face includes the following steps. In the first step, a modified layer 202 which is easily etched than a substrate 200 is formed on the surface of the substrate 200 by, for example, radicals F* produced by plasma. In the second step, a resist layer 203 patterned to have plural circular openings is formed on the surface of the modified layer 202. In the third step, the substrate 200 and the modified layer 202 are subjected to wet etching, for example, in a hydrofluoric acid aq.soln. to form many recesses 238 having smooth slopes on the surface of the substrate 200. In the fourth step, a light-reflecting layer such as aluminum is formed on the surface of the substrate 200 including the a region where recesses 238 are formed.;COPYRIGHT: (C)2000,JPO