HIGHLY DENSE MULTILAYERED THIN FILM AND ITS FILM FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a highly dense multilayered thin film such as an antireflection film and a color resolving filter having improved compactness and stability against an external environment such as humidity and temp., and to provide its film forming method. SOLUTION: In the antireflection film made of a multilayered thin film 4 consisting of, from the substrate side, an intermediate refractive index layer 1, a high refractive index synthesized layer 2 and a low refractive index layer 3, the high refractive index synthesized layer is produced in the following process. A TiO2 film as the main layer (a) which dominantly determines the refractive index of the high refractive index layer is formed to about =10 nm thickness to the stage just before a columnar structure is produced, and then an SiO2 layer as a structure controlling layer (b) is formed to =1/10 thickness of the main layer (a) to produce a unit layer x. The unit layer x is repeatedly laminated into a synthesized layer y having a desired film thickness to obtain the high refractive index synthesized layer 2. Thereby, the compactness can be improved by suppressing the production of the columnar structure in the thin films, and an optical multilayered thin film having excellent environmental stability and productivity can be obtd. without decreasing the optical spectral characteristics as a whole.