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A Novel Measurement Method of Mechanical Properties for Individual Layers in Multilayered Thin Films

机译:多层薄膜中各层力学性能的新测量方法

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摘要

Various multilayered thin films are extensively used as the basic component of some micro-electro-mechanical systems, requiring an efficient measurement method for material parameters, such as Young’s modulus, residual stress, etc. This paper developed a novel measurement method to extract the Young’s moduli and residual stresses for individual layers in multilayered thin films, based on the first resonance frequency measurements of both cantilever beams and doubly-clamped beams. The fabrication process of the test structure, the corresponding modeling and the material parameter extraction process are introduced. To verify this method, the test structures with gold/polysilicon bilayer beams are fabricated and tested. The obtained Young’s moduli of polysilicon films are from 151.38 GPa to 154.93 GPa, and the obtained Young’s moduli of gold films are from 70.72 GPa to 75.34 GPa. The obtained residual stresses of polysilicon films are from −14.86 MPa to −13.11 MPa (compressive stress), and the obtained residual stresses of gold films are from 16.27 to 23.95 MPa (tensile stress). The extracted parameters are within the reasonable ranges, compared with the available results or the results obtained by other test methods.
机译:各种多层薄膜被广泛用作某些微机电系统的基本组件,需要一种有效的材料参数(例如杨氏模量,残余应力等)的测量方法。本文开发了一种新颖的测量方法来提取杨氏模量多层薄膜中各个层的模应力和残余应力,基于悬臂梁和双重夹紧梁的首次共振频率测量结果。介绍了测试结构的制造过程,相应的建模和材料参数提取过程。为了验证该方法,制造并测试了具有金/多晶硅双层梁的测试结构。所获得的多晶硅膜的杨氏模量为151.38 GPa至154.93 GPa,所获得的金膜的杨氏模量为70.72 GPa至75.34 GPa。所获得的多晶硅膜的残余应力为-14.86 MPa至-13.11 MPa(压缩应力),所获得的金膜的残余应力为16.27至23.95 MPa(拉应力)。与可用结果或通过其他测试方法获得的结果相比,提取的参数在合理范围内。

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