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ANODIC CHEMICAL CONVERSION EQUIPMENT, ELECTRODE FOR ANODIC CHEMICAL CONVERSION, AND TREATMENT AND MANUFACTURE OF SUBSTRATE

机译:阳极化学转化设备,用于阳极化学转化的电极以及基质的处理和制造

摘要

PROBLEM TO BE SOLVED: To reduce the contamination of a silicon substrate and the occurrence of abnormal chemical conversion at anodic chemical conversion treatment. ;SOLUTION: The part between the surface side of a silicon substrate 101 to be an object of treatment and a negative electrode 106 is filled with an HF solution 107, and an annular positive electrode 110 is brought into contact with the rear side of the silicon substrate. 101 to apply anodic chemical conversion treatment to the substrate. The surface of the positive electrode 110 is provided with a groove 110a for vacuum-sucking the silicon substrate 101. By adopting the annular positive electrode 110, the contact area between the silicon substrate 101 and the positive electrode 110 can be decreased and the contamination of the silicon substrate 101 can be reduced. Further, by making the positive electrode 110 suck the silicon substrate 101, the occurrence of abnormal chemical conversion caused by the deformation of the silicon substrate 101 owing to internal stress can be reduced.;COPYRIGHT: (C)2000,JPO
机译:要解决的问题:减少硅衬底的污染和在阳极化学转化处理中发生异常化学转化的可能性。 ;解决方案:在要处理的硅基板101的表面侧和负电极106之间的部分填充HF溶液107,并使环形正电极110与硅的背面接触基质。 101,对基板进行阳极化学转化处理。正极110的表面设置有用于真空吸附硅基板101的槽110a。通过采用环形正极110,可以减小硅基板101与正极110之间的接触面积并且污染硅。可以减少硅衬底101。此外,通过使正极110吸附硅基板101,可以减少由于内应力导致的硅基板101的变形引起的异常化学转化的发生。(C)2000,JPO

著录项

  • 公开/公告号JP2000273699A

    专利类型

  • 公开/公告日2000-10-03

    原文格式PDF

  • 申请/专利权人 CANON INC;

    申请/专利号JP19990082351

  • 发明设计人 YAMAGATA KENJI;

    申请日1999-03-25

  • 分类号C25D17/12;C25D11/32;C25D17/06;C25D17/10;C25D21/00;H01L21/02;H01L21/316;H01L27/12;

  • 国家 JP

  • 入库时间 2022-08-22 02:00:47

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