RETICLE FOREIGN MATTER INSPECTION DEVICE, EXPOSURE DEVICE HAVING RETICLE FOREIGN MATTER INSPECTION FUNCTION AND PRODUCTION OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To save the labor for intervention of a person in order to remove foreign matter by removing the foreign matter within a reticle foreign matter inspection device.;SOLUTION: When the foreign matter 2 adhered to the reticle 1 is removed by using the reticle foreign matter inspection device, the reticle 1 is transported to the reticle stage 6b within a foreign matter removal unit 9 by a transporting arm 4 after the inspection of the foreign matter. The transported reticle 1 moves the foreign matter 2 point detected by the foreign matter inspection near to a gaseous N2 injection nozzle where gaseous N2 is injected for 2 to 5 seconds from the gaseous N2 injection nozzle. The inside of the foreign matter removal unit 9 is exhausted simultaneously therewith. The foreign matter 2 on the reticle 1 is blown off by blowing the pressurized N2. The foreign matter inspection is thereafter carried out again to make sure that the foreign matter is removed. The reticle 1 is housed in an original reticle case 3 after the end of the inspection.;COPYRIGHT: (C)2000,JPO